Method for electroplating hard chromium with trivalent chromium
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Application number 201510502003. X Application date 2015. 08. 17 Applicant Inner Mongolia First Machinery Group Co., Ltd. Address 014032, Mailbox No. 2, Qingshan District, Baotou City, Inner Mongolia Autonomous Region Applicant China Ordnance Industry New Technology Promotion Institute Inventor Li Wengang, Sun Ning, Sun Xuanjie, Li Lianxi Zhao Wenjun Zhang Jianqiang Hou Wei Guo Yunpeng Patent agency, China North Industries Group Corporation Patent Center 11011 Agent Liu Dongsheng Name of invention A method of hard chromium electroplating with trivalent chromium Summary The present invention relates to a method for hard chromium electroplating with trivalent chromium, which solves the current problems of hexavalent chromium pollution and thin trivalent chromium electroplating layer. The electrode is immersed in a solution containing iridium and ruthenium and sintered to form a metal titanium plate electroplating anode; a DC power source is used for the power supply. The composition and content of the trivalent chromium electroplating solution are: main salt: chromium sulfate and chromium chloride ; Complexing agent: tartaric acid, diethylene triamine; catalyst: potassium bromide and potassium fluoride; buffer: boric acid-sodium borate system; conductive salt: sodium sulfate and sodium chloride; other substances: perfluoropolyether carboxylic acid Amine salt, glycerin, sucrose, lauryl dimethyl betaine, and the rest is water; control the pH of the plating solution between 1.5 and 2.2, adjust the pH with sulfuric acid and sodium carbonate. The present invention uses trivalent chromium as the main salt, organic acids and their salts as complexing agents, and halides and organic fluorides as catalysts. 40 ymchrome plating can be obtained on steel workpieces. Layer thickness, microhardness HV≦850. |
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